| 1 | Reverse Osmosis System | Pressure-driven membrane separation through a semipermeable membrane. | Municipal water, softened water, or prefiltered water. | Typically 95–99% salt rejection; conductivity commonly reduced to approximately 5–50 µS/cm, depending on feed quality and design. | 0.1–100 m³/h | Dissolved salts, hardness, heavy metals, microorganisms, particles, and many organic compounds. | Primary purification for laboratories, electronics plants, hospitals, and industrial water systems. | High contaminant removal with relatively low energy consumption compared with thermal processes. | Requires pretreatment and produces a reject-water stream; it normally does not achieve ultrapure quality alone. |
| 2 | Electrodeionization Unit | Uses ion-exchange resins, selective membranes, and an electric field to continuously remove ions. | RO permeate with low hardness, low carbon dioxide, and low particulate loading. | Often up to 10–18 MΩ·cm at 25°C when correctly integrated and operated. | 0.05–20 m³/h | Ionic contaminants, including cations, anions, and weakly ionized species to a limited extent. | Continuous production of Type II or high-quality process water after RO. | No routine chemical regeneration and stable continuous operation. | Sensitive to feed-water quality, carbon dioxide, silica, hardness, and oxidizing contaminants. |
| 3 | Deionization Cartridge System | Ion-exchange resins exchange hydrogen and hydroxide ions for dissolved cations and anions. | RO water or relatively low-conductivity pretreated water. | Can produce up to 18.2 MΩ·cm water when used as a final polishing stage. | 0.5–500 L/min | Dissolved ionic contaminants, including salts, acids, bases, and some metal ions. | Point-of-use polishing, laboratory water dispensers, and low-to-medium flow applications. | Compact design and very high ionic removal capability. | Resin capacity is finite; exhausted cartridges must be replaced or regenerated, and organics may pass through. |
| 4 | Ultraviolet Disinfection System | Ultraviolet radiation, commonly near 254 nm, damages the DNA of microorganisms and prevents reproduction. | Filtered, low-turbidity purified water. | Provides microbial inactivation; it does not significantly reduce conductivity or dissolved solids. | 0.1–100 m³/h | Bacteria, viruses, and other microorganisms; performance depends on UV dose and water transmittance. | Microbial control in storage tanks, distribution loops, and purified-water systems. | Rapid, chemical-free disinfection with no residual disinfectant added to the water. | Offers no lasting residual protection and requires lamp monitoring, cleaning, and periodic replacement. |
| 5 | UV Photo-Oxidation Unit | High-energy UV radiation, often around 185/254 nm, breaks down organic compounds and supports oxidation to carbon dioxide and water. | Deionized or RO-treated water requiring low total organic carbon. | TOC can commonly be reduced to below 5–10 ppb in a properly designed ultrapure-water loop. | 1–100 L/min | Trace organic compounds and microorganisms; some systems also reduce residual oxidizable contaminants. | Semiconductor, pharmaceutical, analytical, and molecular biology applications. | Effective control of organic contamination that ion-exchange alone may not remove. | Performance depends on UV intensity, lamp age, water quality, and adequate downstream polishing. |
| 6 | Ultrafiltration System | Pressure-driven membrane separation using membranes with pores typically in the nanometer range. | RO or deionized water, usually after particulate and organic pretreatment. | Strong reduction of particles, colloids, bacteria, endotoxins, and macromolecules; dissolved ions generally remain. | 0.05–50 m³/h | Suspended solids, colloids, microorganisms, endotoxins, proteins, and other high-molecular-weight substances. | Biotechnology, pharmaceutical water systems, laboratory polishing, and final particle control. | Excellent removal of microorganisms and large organic molecules without changing ionic balance substantially. | Does not remove most dissolved salts and requires control of membrane fouling and cleaning. |
| 7 | Submicron Final Filtration System | Mechanical depth or membrane filtration captures particles by size exclusion and, in some media, adsorption. | Purified or deionized water from a storage and distribution system. | Common ratings include 0.1, 0.2, or 0.45 µm nominal or absolute filtration, depending on the filter design. | 0.1–500 L/min | Particles, filterable bacteria, and some colloidal material. | Point-of-use protection for laboratory instruments, wet benches, and critical dispensing points. | Simple installation and effective control of particulate contamination close to the user. | Does not remove dissolved ions or most low-molecular-weight organics; filters require periodic replacement. |
| 8 | Ultrapure Water Recirculation Loop | Continuously circulates purified water through treatment, storage, monitoring, and distribution components. | RO/EDI water or previously polished ultrapure water. | Can maintain approximately 18.2 MΩ·cm, low TOC, and controlled microbial levels when properly designed. | 0.2–20 m³/h loop circulation | Controls recontamination, particles, ions, and microorganisms introduced during storage and distribution. | Multi-user laboratories, pharmaceutical facilities, hospitals, and electronics manufacturing. | Maintains quality at multiple outlets and reduces stagnant-water zones. | Higher installation cost and complexity; dead legs, unsuitable materials, and low flow can quickly degrade quality. |
| 9 | Water Distillation System | Evaporates water and condenses the vapor, separating many nonvolatile contaminants from the product stream. | Potable or pretreated water. | Typically produces distilled water with low dissolved solids; final resistivity is generally below that of fully polished ultrapure water unless followed by deionization. | 1–500 L/h | Many salts, heavy metals, microorganisms, particles, and nonvolatile contaminants. | Laboratories, pharmaceutical production, and applications requiring a robust thermal purification step. | Strong microbial control and broad removal of nonvolatile contaminants. | High energy demand, slower production, and possible carryover of volatile compounds without additional treatment. |
| 10 | Integrated Ultrapure Water System | Combines pretreatment, RO, deionization or EDI, UV, filtration, storage, monitoring, and point-of-use polishing. | Municipal, softened, or other validated feed water. | Designed to meet application-specific Type I, Type II, or Type III water requirements; Type I systems may reach 18.2 MΩ·cm at 25°C. | 0.02–20 m³/h product flow | Particles, dissolved ions, organics, microorganisms, endotoxins, and other contaminants through staged treatment. | Research laboratories, clinical testing, pharmaceutical manufacturing, and high-purity industrial processes. | Provides the most complete control of water quality through coordinated treatment stages and online monitoring. | Highest capital and maintenance requirements; performance depends on correct system configuration and operating discipline. |